The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC Conference is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Here, mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.
May we offer you a fancy quick look through the telescope? Here is a brief preview of the conference programme:
The EMLC Conference 2024 will take place in the wonderful setting of MINATEC at CEA-Leti in Grenoble, France.
The conference will start on Monday, June 17th at 2 PM with a Tutorial Session, followed by a Session with student presentations. From 7 PM to 9 PM there will be a EMLC 2024 Get Together event at the MINATEC site.
On Tuesday, June 18th, the conference will be continued at 9 AM in the MINATEC Platine Auditorium with a 1st Plenary Session, followed by a Session on Data Analytics. In the afternoon, there will be Sessions on DUV and EUV Lithography and Mask Patterning and Processing, followed by the Poster Session.
On Wednesday, June 19th, EMLC 2024 is continued at 9 AM with the 2nd Plenary Session followed by a Session on Nano-Imprint Lithography. After lunch, there are Sessions on Mask Metrology, Tuning and Inspection and Optical & Electron Beam Direct Write. The 12th Session will complete the conference. The title of this Session will focus on a novel topic.
The EMLC Conference 2024 - we count on you!
Hopefully I have awakened your interest to attend this – again – outstanding international conference on the forefront of mask fabrication and lithography as well as very interesting related topics for the semiconductor industry.
I hope you can make it.
Uwe Behringer, Conference Chair
