EMLC
38th Mask and Lithography Conference 2023 | Dresden, Germany | June 19-21, 2023
EMLC 2022

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Toward New Shores in 2023 - Welcome to the EMLC Conference 2023 in Dresden, Germany

On behalf of the VDE/VDI/GMM Organization, the EMLC 2023 Sponsors and the EMLC 2023 Organization Committee we would like to welcome you to the 38th European Mask and Lithography Conference, EMLC 2023, at the Hilton Hotel in Dresden, Germany.

The conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC 2023 conference is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Here, mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.

Uwe Behringer, Conference Chair

EMLC Conference 2023

Dr. Uwe Behringer, UBC Microelectronics
Conference Chair

Uwe-Behringerklein
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target audience

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

target audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

Topics

Conference topics

Topics

Mask Manufacturing and Mask Business
- Mask Data Preparation
- Pattern Generation: Writing, Etch, etc.
- Photomask Processes & Materials
- Metrology Tools & Technologies
- Defect Inspection & Repair
- Cleaning & Haze
- Pellicles & Mask Boxes
- Mask Process Yield & Cycle Time
- Photomasks for RET (OPC, ILT) ; PSM
- Mask Business and Management
- Mask Cost and Mask Development Strategy
- Future Mask Demand
Lithographic Systems and Processes
- Optical Resolution Enhancements including OPC,
Freeform Illumination, Source-Mask-optimization (SMO)
and Inverse Lithography Technology (ILT)
- Material-and Process driven Resolution Enhancements
including Multiple Patterning and Chemical Shrinking
- Immersion Lithography including Defectivity
- Lithography Process Control
- Lithography and Etch Simulation including rigorous
physical/chemical Models and Compact Models
Emerging Mask and Lithography Technologies
- EUV-Lithography including Masks, Materials Processes
and Infrastructure.
- Direct Write / Maskless Technologies including Multi-
Beam Technologies
- Nano-Imprint Lithography (NIL), Soft Lithography, and
Microprinting
- Applicationof Artificial Intelligence including Deep
Learning in Lithography
Emerging Applications
- Non-IC Applications including Si-Photonics, flat Panel
Displays and MEMS/MEOMS
- Lithographic Systems for non-IC Applications, including
Laser Direct Write, Interference Lithography, and Mask
Aligners

Committee

Committee Members

Committee

The EMLC 2023 International Program Committee

Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Loeschner, Hans, IMS Nanofabrication, Vienna, Austria


Program Co-Chairs
Peters, Jan Hendrik, bmbg consult, Radebeul, Germany
Sarlette, Daniel, Infineon, Dresden, Germany

Other Program Committee Members
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Galler, Reinhard, Equicon, Jena, Germany
Kapilevich, Izak, AMAT, USA
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Savari, Serap, Texas A&M University College Station, USA
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Seltmann, Rolf, Dresden, Germany
Tschinkl, Martin, Toppan Photomasks Germany GmbH, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Wiley, Jim, Santa Clara, CA, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shushuke, NuFlare, Japan
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA

Exhibition

Technical Exhibition

Exhibition

Parallel to the EMLC 2023 Conference, there will be a Technical Exhibition with booth space for about 30 exhibitors on Tuesday and Wednesday (June 20th and 21st 2023) . Presentation tables and pin boards will be available.

During the exhibition hours, mask and device manufacturers will present their companies and their products.
Please, register in time for the exhibition!

Technical Exhibition Download

Downloads

Downloads

Downloads
Downloads + Links
Contact ak

Contact

Contact ak

Please contact GMM-Office for questions concerning the conference.

You would like to be informed about the next steps concerning this conference? So please register as prospective customer.

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previous events

Previous Events

Important Dates

Dates in 2023

February 24, 2023

Submission of abstracts

April 14, 2023

Notification of authors

July 20, 2023

Submission of presentation material

June 19-21, 2023

EMLC Conference 2023 in Dresden, Germany

June 30, 2023

Submission of manuscripts to SPIE




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