40th EMLC Conference Dresden - Welcome Page

The EMLC Conference
annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Within this platform, researchers and users have the opportunity to both familiarize themselves with the latest developments and results as well as to enter into fruitful discussion with colleagues from different companies and research institutions.

May we invite you to charming Dresden
In 2025, the EMLC Conference will be taking place for the 40^th time. Following a good tradition, the Hilton Hotel in enchanting Dresden will be the venue.

A short preview of the program
The conference will be opened on Monday, June 16^th with tutorials and a dedicated student session, followed by the EMLC 2025 Get-Together in the early evening. On Tuesday, June 17th, and 18^th, 2025 the conference will be continued with plenary talks and technical presentations, which will span all current topics of interest in semiconductor industry, new and emerging applications and research. The conference dinner will be held on Tuesday evening.

A technical exhibition will be organized in parallel to the main conference days.

Hopefully, we have awakened your interest to attend this – again – outstanding international conference on the forefront of mask fabrication and lithography as well as very interesting, related topics for the semiconductor industry.

We hope you can make it. Please also consider submitting a contribution to EMLC 2025.

Your EMLC 2025 Conference Chairs

Jo Finders and Ines Stolberg

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

Committee Members

The EMLC 2025 International Program Committee

Honorary President
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany

Conference Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Tekscend Photomask, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Loeschner, Hans, IMS Nanofabrication, Brunn am Gebirge & Vienna, Austria
Bottiglieri, Gerardo, ASML, The Netherlands
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Peters, Jan Hendrik, BMBG Consult, Radebeul, Germany

Other Program Committee Members
Abboud, Frank, Intel Corporation, Santa Clara, CA, USA
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Fay, Aurelien, CEA-Leti, Grenoble, France
Galler, Reinhard, EQUIcon, Dresden, Germany
Jefferies, James, HOYA Europe, London, UK
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Maas, Raymond, ASML, Veldhoven, The Netherlands
Maly, Enrico, Photronics MZD GmbH, Dresden, Germany
Muehlberger, Michael, Profactor, Steyr-Gleink, Austria
Noack, Nico, AMTC Dresden, Germany
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Scheruebl, Thomas, Carl Zeiss SMT, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Offenbach am Main, Germany
Schneider, Jens, Infineon Technologies, Dresden, Germany
Schuch, Nivea, Applied Materials, Grenoble, France
Sundermann, Frank, STMicroelectronics, Crolles, France
Tschinkl, Martin, Tekscend Photomask, Dresden, Germany
Varga, Ksenija, EV Group, St. Florian am Inn, Austria
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shusuke, Carl Zeiss Co., Ltd., Tokyo, Japan
Zeggaoui, Nassima, Siemens Industry Software Inc., Meylan, France
Zurbrick, Larry, Keysight Technologies, Santa Clara, USA

ZEISS Award for Talents in Photomask Industry

ZEISS endows the "ZEISS Award for Talents in Photomask Industry"

The award was established in 2016 to support students working in the fields of photomasks.

To be considered,

The student must present a poster or presentation at European Mask and Lithography Conference
The students must identify themselves as a student during abstract submission
The student must be the lead manuscript author
The student must attend the conference and present it during the session or be present during the poster session

Assessment - Award Committee

The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.

The Award - Invitation to ZEISS European Summer School

Winners will be awarded a ZEISS certificate and a trophy. He or she will be invited to the ZEISS European Summer School in Oberkochen, Germany, where students get deep insights into ZEISS’ semiconductor optics manufacturing and related aspects of semiconductor technology. The event is triggered by the Important Project of Common European Interest (IPCEI) to support research, innovation and the first industrial deployment of microelectronics and communication technologies across the value chain.
The winner will have the opportunity to present his/ her paper in this unique environment. Travel costs for the ZEISS European Summer school will be covered.

Donation

In addition, a donation to the amount of 2,500 EUR will be granted.

Call for Papers

Venue/ Travel Info/ Hotel booking

Hilton Dresden
An der Frauenkirche 5, 01067 Dresden,
Germany
phone: +49 (0)351 8642-0
E-Mail: info@hiltondresden.com

Hilton Hotel Dresden - on the doorstep of Dresden's Old Town - Your Event Location

The Hilton Hotel is located at the heart of Dresden's Old Town, one block from the River Elbe and overlooking Dresden's Frauenkirche, the Church of Our Lady. Hilton is within a kilometer of local dining and historic sites, such as the Zwinger building and its surrounding gardens. Enjoy access to the health club, featuring a fitness center, indoor pool with sauna, outdoor whirlpool - and, above all: Enjoy the EMLC Conference 2025 in Dresden!

The room rate is € 149 per night including breakfast.
Please book your rooms in time as the room contingent expires on April 16, 2025.

Please use the underlined link for your bookings!

Contact

Please contact GMM-Office for questions concerning the conference.

You would like to be informed about the next steps concerning this conference? So please register as prospective customer.

Previous Events

Dates in 2025
extended until February 14, 2025	Submission of abstracts
April 14, 2025	Notification of acceptance for authors
June 16-18, 2025	EMLC Conference 2025 in Dresden, Germany
Extended to July 16, 2025	Submission of manuscripts to SPIE