EMLC 2020 | June 22 - 24 | Leuven | Belgium - Welcome Page

About

In 2021, the EMLC will have a new look - as a one-day online event!

However, the focus of this new event remains unchanged: the main topics are state-of-the-art of mask technology and lithography, such as mask manufacturing, mask business, lithography and mask applications, emerging mask & lithography technologies, and mask & lithography equipment.

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

Conference topics

Mask Manufacturing and Mask Business
- Mask Data Preparation
- Pattern Generation: Writing, Etch, etc.
- Photomask Processes & Materials
- Metrology Tools & Technologies
- Defect Inspection & Repair
- Cleaning & Haze
- Pellicles & Mask Boxes
- Mask Process Yield & Cycle Time
- Photomasks for RET (OPC, ILT) ; PSM
- Mask Business and Management
- Mask Cost and Mask Development Strategy
- Future Mask Demand
Lithographic Systems and Processes
- Optical Resolution Enhancements including OPC,
Freeform Illumination, Source-Mask-optimization (SMO)
and Inverse Lithography Technology (ILT)
- Material-and Process driven Resolution Enhancements
including Multiple Patterning and Chemical Shrinking
- Immersion Lithography including Defectivity
- Lithography Process Control
- Lithography and Etch Simulation including rigorous
physical/chemical Models and Compact Models
Emerging Mask and Lithography Technologies
- EUV-Lithography including Masks, Materials Processes
and Infrastructure.
- Direct Write / Maskless Technologies including Multi-
Beam Technologies
- Nano-Imprint Lithography (NIL), Soft Lithography, and
Microprinting
- Applicationof Artificial Intelligence including Deep
Learning in Lithography
Emerging Applications
- Non-IC Applications including Si-Photonics, flat Panel
Displays and MEMS/MEOMS
- Lithographic Systems for non-IC Applications, including
Laser Direct Write, Interference Lithography, and Mask
Aligners

Committee Members

The EMLC 2021 International Program Committee

Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Loeschner, Hans, IMS Nanofabrication, Vienna, Austria

Program Co-Chairs
Peters, Jan Hendrik, bmbg consult, Radebeul, Germany
Sarlette, Daniel, Infineon, Dresden, Germany

Other Program Committee Members
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Galler, Reinhard, Equicon, Jena, Germany
Kapilevich, Izak, AMAT, USA
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Savari, Serap, Texas A&M University College Station, USA
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Seltmann, Rolf, Dresden, Germany
Tschinkl, Martin, Toppan Photomasks Germany GmbH, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Wiley, Jim, Santa Clara, CA, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shushuke, NuFlare, Japan
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA

Program Schedule

Tuesday, June 22^nd 2021 -
EMLC 2021 Live Panel Sessions

CEST (Central European Summer Time)	Four Live Panel Sessions on Tuesday, June 22, 2021
08:00	The meeting is opened by the VDE GMM Meeting Host Hatice Altintas
08:00 - 11:15	Part 1
08:05 - 08:15	Welcome by Uwe Behringer , UBC Microelectronics, EMLC 2021 Conference Chair
08:15 - 09:30	1st Panel on EUV Lithography Topic: EUV Lithography towards 2030
	Panel Chair Jo Finders, ASML, The Netherlands
	Panel Co-Chair Albrecht Ehrmann, Carl Zeiss SMT, Germany
	Panelists
	Gijsbert Rispens, ASML, The Netherlands EUV system engineering imaging and resist
	Ardavan Niroomand, IMEC, Belgium Program director for ASML/IMEC Advanced Patterning Center
	Heiko Feldmann, Carl Zeiss SMT, Germany Head of Roadmap, initiating technology and product developments for semiconductor manufacturing equipment
	Hazem Mesilhy, Fraunhofer IISB, Germany PhD student/ researcher, computational lithography, High-NA EUV, mask 3D, optical simulations, multi-objective optimization
	Renzo Capelli, Carl Zeiss SMS, Germany System Engineering, ZEISS Semiconductor Mask Solutions (SMS), EUV mask metrology
	Jan van Schoot, ASML, The Netherlands Director EUV System Engineering
09:30 - 09:45	Short Break
09:45 - 11:15	2nd Panel on EUV Mask Topics Topic: Readiness of the Mask and Lithography Infrastructure for current and future EUV (phase shift masks and anamorphic) and suitable tools for mask making in EUV
	Panel Chair: Jan Hendrik Peters, BMBG Consult, Germany
	Panel Co-Chair: Martin Tschinkl, Toppan Europe, Germany
	Panelists
	Tilmann Heil, Carl Zeiss SMT, Germany Mask Repair; Mask Qualification; EUV: scaling for advanced nodes, High NA, phase shifting masks
	Eelco van Setten, ASML, The Netherlands EUV imaging - specifically High-NA, mask contribution to imaging or EPE
	Takahiro Onoue, HOYA, Japan EUV materials, especially PSM, transparent backside
	Kei Hattori, SHIBAURA, Japan EUV clean and etch, material properties, layout requirements
	Joost Bekaert, IMEC, Belgium Stitching and Black Borders, CNT Pellicle, Contour Metrology, OPC
	Dong Gun Lee, ESOL, South Korea EUV phase shift measurements
11:15 - 14:30	Casual Meetings during the break Between the morning and afternoon session you have the possibility to casually meet with your peers in the meeting space wonder.me provided by the conference committee. Just join with audio and video connected, move around and gather in small discussion circles. Within these circles, you will be automatically placed in a zoom-like video chat with your colleagues.
14:30 - 17:45	Part 2
14:35 - 14:45	Welcome by Uwe Behringer , UBC Microelectronics, EMLC 2021 Conference Chair
14:45 - 16:00	3rd Panel on Manufacturing Data Analytics Topic: Turning Data into Silicon: The Digital Transformation of the Wafer Fabrication Processes
	Panel Chair Bertrand Le-Gratiet, ST Microelectronics, France
	Panel Co-Chair Serap Savari, Texas A&M University, USA
	Panelists
	Philippe Leduc, STMicroelectronics, France
	Benjamin Lenz, Infineon, Germany Infineon Technologies AG Senior Manager Offline Analytics
	Harry J. Levinson, HJL Lithography, USA HJL Lithography, LLC provides consulting and training services in lithography and lithography process and control
	Jelle Nije, ASML, The Netherlands Senior product manager, Advanced Analytics portfolio enabling fast time to insight and optimize decision making
	Clemens Utzny, KLA QONIAC, Germany Qoniac provides revolutionary lithography & patterning optimization for the semiconductor industry
16:00 - 16:15	Short Break
16:15 - 17:30	4th Panel on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry
	Panel Chair Andreas Erdmann, Fraunhofer IISB, Germany
	Panel Co-Chair Ines Stolberg, Vistec Electron Beam, Germany Manager Sales & Marketing
	Panelists
	René Carpaij, ASML, The Netherlands Group Leader EUV Imaging
	Jan Hoentschel, Globalfoundries, Germany Director Integration & Technology
	Bertrand Le-Gratiet, ST Microelectronics, France Fellow Lithography/ Metrology
	Hans-Jürgen Stock, Synopsys Munich, Germany Manager Research and Prototyping
	Michael Woittennek, X-Fab, Germany Manager Operations
	Holger Jennewein, Carl Zeiss SMT, Germany Director Optics Metrology
17:30 - 17:45	Final Remarks, Uwe Behringer, UBC Microelectronics and EMLC Conference Chair 2021 Announcement of EMLC 2022, in Leuven, Belgium, on June 20-23, 2022