38th Mask and Lithography Conference 2023 | Dresden, Germany | June 19-21, 2023
Flashback: EMLC 2023


The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC Conference is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Here, mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.

That was the EMLC Conference 2023 in Dresden, Germany

After a 4 year break, the European Mask and Lithography Conference (EMLC) took place once again in Dresden in June 2023. At its 38th event, the conference was able to set a new attendance record with about 200 participants. The participants were again offered a rich program in Dresden from Monday afternoon to Wednesday evening with 38 oral presentations (including 5 keynotes and 11 invited presentations), 12 posters and 2 tutorials. The contents of these presentations reflected the current focus and development directions of mask and lithography technology, but also covered general aspects of the semiconductor industry.

The EMLC 2023 - more than just a conference!

For all participants, the conference breaks, the exhibition accompanying the conference with 10 companies, the get-together on Monday evening and especially the conference dinner on Tuesday evening in the historic Pulverturm in Dresden offered good opportunities for professional exchange with colleagues and companies from our industry.

Save the Date: The next EMLC will be held in Grenoble from June 17 to 19, 2024.

Uwe Behringer, Conference Chair

EMLC 2023

Dr. Uwe Behringer, UBC Microelectronics
Conference Chair

target audience

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

target audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.


Conference topics


Mask Manufacturing and Mask Business
- Mask Data Preparation
- Pattern Generation: Writing, Etch, etc.
- Photomask Processes & Materials
- Metrology Tools & Technologies
- Defect Inspection & Repair
- Cleaning & Haze
- Pellicles & Mask Boxes
- Mask Process Yield & Cycle Time
- Photomasks for RET (OPC, ILT) ; PSM
- Mask Business and Management
- Mask Cost and Mask Development Strategy
- Future Mask Demand
Lithographic Systems and Processes
- Optical Resolution Enhancements including OPC,
Freeform Illumination, Source-Mask-optimization (SMO)
and Inverse Lithography Technology (ILT)
- Material-and Process driven Resolution Enhancements
including Multiple Patterning and Chemical Shrinking
- Immersion Lithography including Defectivity
- Lithography Process Control
- Lithography and Etch Simulation including rigorous
physical/chemical Models and Compact Models
Emerging Mask and Lithography Technologies
- EUV-Lithography including Masks, Materials Processes
and Infrastructure.
- Direct Write / Maskless Technologies including Multi-
Beam Technologies
- Nano-Imprint Lithography (NIL), Soft Lithography, and
- Applicationof Artificial Intelligence including Deep
Learning in Lithography
Emerging Applications
- Non-IC Applications including Si-Photonics, flat Panel
Displays and MEMS/MEOMS
- Lithographic Systems for non-IC Applications, including
Laser Direct Write, Interference Lithography, and Mask


Committee Members


The EMLC 2023 International Program Committee

Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Loeschner, Hans, IMS Nanofabrication, Vienna, Austria

Program Co-Chairs
Peters, Jan Hendrik, BMBG Consult, Radebeul, Germany
Sarlette, Daniel, Infineon, Dresden, Germany

Other Program Committee Members
Abboud, Frank, Intel Corporation, Santa Clara, CA, USA
Born, René, Photronics MZB GmbH, Dresden, Germany
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Galler, Reinhard, Equicon, Jena, Germany
Jefferies, James, HOYA Corporation Europe Branch, London, Great Britain
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Noack, Nico, AMTC Dresden, Germany
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Savari, Serap, Texas A&M University College Station, USA
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schneider, Jens, Infineon Technologies AG, Dresden, Germany
Schuch, Nivea, Applied Materials, Grenoble, France
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Seltmann, Rolf, Dresden, Germany
Shushuke, Yoshitake, NuFlare, Japan
Sundermann, Frank, STMicroelectronics, Crolles, France
Tiron, Raluca, Grenoble, France
Tschinkl, Martin, Toppan Photomasks Germany GmbH, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Varga, Ksenije, EV Group, St. Florian am Inn, Austria
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA

ZEISS Award for Talents in Photomask Industry

ZEISS endows the "ZEISS Award for Talents in Photomask Industry" 

The award was established in 2016 to support students working in the fields of photomasks.

To be considered,

  • The student must present a poster or presentation at European Mask and Lithography Conference
  • The students must identify themselves as a student during abstract submission
  • The student must be the lead manuscript author
  • The student must attend the conference and present it during the session or be present during the poster session

The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.

Winners will be awarded a ZEISS certificate and a trophy. In addition, the winner will be invited to present his or her work at SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference 2023 in Monterey / CA. He or she receives a donation of 2,500 EUR to cover the travel expenses.

"Schnuppertag" - Taster Day for Students

Come to the EMLC Conference for a Taster

Offer to all students: Visit the EMLC Conference on 19 June for free

The program on June 19 includes

  • Tutorial Sessions
  • Student Presentations
  • Get Together

For registration, please use the link in the download section.

Downloads + Links

Technical Exhibition


Parallel to the EMLC 2023 Conference, there will be a Technical Exhibition with booth space for about 30 exhibitors on Tuesday and Wednesday (June 20th and 21st 2023) . Presentation tables and pin boards will be available.

During the exhibition hours, mask and device manufacturers will present their companies and their products.
Please, register in time for the exhibition!

Technical Exhibition Download



Downloads + Links
Contact ak


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Please contact GMM-Office for questions concerning the conference.

You would like to be informed about the next steps concerning this conference? So please register as prospective customer.

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previous events

Previous Events

Important Dates

Dates in 2023

February 24, 2023

Submission of abstracts

April 14, 2023

Notification of authors

July 20, 2023

Submission of presentation material

June 19-21, 2023

EMLC Conference 2023 in Dresden, Germany

June 30, 2023

Submission of manuscripts to SPIE

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