EMLC
37th Mask and Lithography Conference 2022 | Leuven, Belgium | June 20-23, 2022
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EMLC 2022 - Toward New Shores in 2022

May we also inform you that the EMLC Committee Members are optimistic - for this reason they already started planning the 37th EMLC Conference which will take place in Leuven, Belgium, from 20 - 23 June 2022, hopefully as face-to-face-event in the usual form.

Welcome to the EMLC 2022 in Leuven, Belgium

On behalf of the VDE/VDI/GMM Organization, the EMLC 2022 Sponsors and the EMLC 2022 Organization Committee we would like to welcome you to the 37th European Mask and Lithography Conference, EMLC 2022, at the KU University in Leuven, Belgium.

The conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC 2022 conference is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Here, mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.

Planned Conference Program
3 Tutorials and 3 Keynotes and more than 15 Invited Speakers.

1st TUTORIAL: Peter De Bisschop, IMEC, Leuven, Belgium "Stochastic effects in lithography: the ultimate resolution limit?”

2nd TUTORIAL: Rogier Verberk, TNO, Delft, The Netherlands “Synergy between Quantum Computing and SC Technology”

3rd TUTORIAL: Takeo Watanabe, University of Hyogo, Japan “Current status and prospect for EUV lithography”

On Tuesday, June 21st, there are two Plenary Sessions and conference Sessions "Mask Patterning, Metrology & Process"; “EUV Lithography”; “Quantum Computing & Photonics”; followed by the 2nd part of the “Poster Session”.

In the Plenary Sessions, we have the honor of the first Keynote speaker Luc Van Den Hove, IMEC, Leuven, Belgium.
The second Keynote speaker will be Frank E. Abboud, Intel Corporation, Santa Clara, CA, USA, who will talk about “Photomask Challenges for Upcoming Technology Nodes”.

On Tuesday afternoon the third Keynote speaker Jos P.H. Benschop, ASML, Veldhoven, The Netherlands, will report on “EUV Lithography; past, present and future”.

On Wednesday, June 22nd, the conference will start with the Announcement of the EMLC 2022 Best Poster Award, followed by the BACUS 2022 and PMJ 2022 Conference Announcements.

As every year we will have invited presentations of the Best Poster of BACUS 2021 and of the Best Paper of PMJ 2022.

As next Session “Data Analytics in Manufacturing” will continue on Wednesday, June 2022, followed by the “EUV Mask Inspection & Repair” Session. Also in the afternoon we have set up a Session called “Lithography Simulation and Future Nano-Lithography & Nano-Patterning”.

Finally, the last session will be focused on “Student Oral Presentations”. 

Technical Exhibition
Parallel to the EMLC 2022 conference the "Technical Exhibition" will take place in the Jubilee Hall of KU Leuven. The opening hours are Tuesday, June 21st, from 10:00 AM to 6:00 PM and Wednesday, June 22nd, from 10:00 AM to 4:00 PM. Here mask and device manufacturers will present their companies and their products.

Conference Dinner Banquet
On Tuesday evening, June 21st, 2022 after the Poster Session, the EMLC 2022 Conference Dinner will take place at the “Faculty Club” in Leuven (within ten minutes’ walk from the conference site).

Thursday Morning, June 23rd, 2022 after the EMLC2022 Conference, IMEC in Leuven has agreed to organize
a visit at IMEC.
A bus will take the signed people (maximum 50 participants) to the IMEC facility. The tour will start at 09:40 AM from the Faculty Club where we had dinner on Tuesday.

Uwe Behringer

Event 2021

Dr. Uwe Behringer, UBC Microelectronics
Conference Chair

Uwe-Behringerklein
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target audience

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

target audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

Topics

Conference topics

Topics

Mask Manufacturing and Mask Business
- Mask Data Preparation
- Pattern Generation: Writing, Etch, etc.
- Photomask Processes & Materials
- Metrology Tools & Technologies
- Defect Inspection & Repair
- Cleaning & Haze
- Pellicles & Mask Boxes
- Mask Process Yield & Cycle Time
- Photomasks for RET (OPC, ILT) ; PSM
- Mask Business and Management
- Mask Cost and Mask Development Strategy
- Future Mask Demand
Lithographic Systems and Processes
- Optical Resolution Enhancements including OPC,
Freeform Illumination, Source-Mask-optimization (SMO)
and Inverse Lithography Technology (ILT)
- Material-and Process driven Resolution Enhancements
including Multiple Patterning and Chemical Shrinking
- Immersion Lithography including Defectivity
- Lithography Process Control
- Lithography and Etch Simulation including rigorous
physical/chemical Models and Compact Models
Emerging Mask and Lithography Technologies
- EUV-Lithography including Masks, Materials Processes
and Infrastructure.
- Direct Write / Maskless Technologies including Multi-
Beam Technologies
- Nano-Imprint Lithography (NIL), Soft Lithography, and
Microprinting
- Applicationof Artificial Intelligence including Deep
Learning in Lithography
Emerging Applications
- Non-IC Applications including Si-Photonics, flat Panel
Displays and MEMS/MEOMS
- Lithographic Systems for non-IC Applications, including
Laser Direct Write, Interference Lithography, and Mask
Aligners

Committee

Committee Members

Committee

The EMLC 2022 International Program Committee

Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Loeschner, Hans, IMS Nanofabrication, Vienna, Austria

Program Co-Chairs
Peters, Jan Hendrik, bmbg consult, Radebeul, Germany
Sarlette, Daniel, Infineon, Dresden, Germany

Other Program Committee Members
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Galler, Reinhard, Equicon, Jena, Germany
Kapilevich, Izak, AMAT, USA
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Savari, Serap, Texas A&M University College Station, USA
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Seltmann, Rolf, Dresden, Germany
Tschinkl, Martin, Toppan Photomasks Germany GmbH, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Wiley, Jim, Santa Clara, CA, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shushuke, NuFlare, Japan
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA

Exhibition

Technical Exhibition

Exhibition

Parallel to the EMLC 2022 conference the "Technical Exhibition" will take place in the Jubilee Hall of KU Leuven. The opening hours are Tuesday, June 21st, from 10:00 AM to 6:00 PM and Wednesday, June 22nd, from 10:00 AM to 4:00 PM.

During the exhibition hours, mask and device manufacturers will present their companies and their products.
Please, register in time for the exhibition!

Technical Exhibition Download

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Downloads

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Contact ak

Contact

Contact ak

Please contact GMM-Office for questions concerning the conference.

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previous events

Previous Events

Important Dates

Dates in 2022
April 15, 2022Submission of abstracts
May 6, 2022Notification of authors
June 20-23, 2022EMLC Conference 2022 in Leuven, Belgium
June 30, 2022Submission of manuscripts to SPIE
June 30, 2022Submission of presentation material

 

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