EMLC

www.emlc-conference.com

| Photo provided by Toppan Photomasks
2018-08-06 event information

Program

The focus of this 2½ day conference is state-of-the-art of mask technology and lithography, such as mask manufacturing, mask business, lithography and mask applications, emerging mask & lithography technologies, and mask & lithography equipment.

Tutorial Speakers

De-Bisschop_Peter

Peter De Bisschop, 1st Tutorial

Peter De Bisschop / IMEC, Leuven, Belgium,

Researcher Lithography; “Stochastic effects in lithography: the ultimate resolution limit?"

De-Bisschop_Peter

Peter De Bisschop / IMEC, Leuven, Belgium,

Researcher Lithography; “Stochastic effects in lithography: the ultimate resolution limit?"

VERBERK_Rogier_2nd-TUTORIAL

Rogier Verberk, 2nd Tutorial

Rogier Verberk / TNO, Delft, The Netherlands,

Director Semiconductor Equipment

"Synergy between Quantum Computing and Semiconductor Technology"

VERBERK_Rogier_2nd-TUTORIAL

Rogier Verberk / TNO, Delft, The Netherlands,

Director Semiconductor Equipment

"Synergy between Quantum Computing and Semiconductor Technology"

Watanabe_Takeo

Takeo Watanabe, 3rd Tutorial

Takeo Watanabe / University of Hyogo, Hyogo, Japan,

Director of the Center for EUVL, Professor & Dean at the University of Hyogo

“Current status and prospect for EUV lithography”

Watanabe_Takeo

Takeo Watanabe / University of Hyogo, Hyogo, Japan,

Director of the Center for EUVL, Professor & Dean at the University of Hyogo

“Current status and prospect for EUV lithography”

Keynote Speakers

VAN-DEN-HOVE_Luc_1st-KEYNOTE

Luc Van Den Hove, 1st Keynote

Luc Van Den Hove / IMEC, Leuven, Belgium,

President & CEO IMEC

“Title t.b.d.”

VAN-DEN-HOVE_Luc_1st-KEYNOTE

Luc Van Den Hove / IMEC, Leuven, Belgium,

President & CEO IMEC

“Title t.b.d.”

Abboud_Frank

Frank E. Abboud, 2nd Keynote

Frank E. Abboud / Intel Corporation, Santa Clara, CA, USA

Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation

“Photomask Challenges for Upcoming Technology Nodes”

Abboud_Frank

Frank E. Abboud / Intel Corporation, Santa Clara, CA, USA

Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation

“Photomask Challenges for Upcoming Technology Nodes”

Benschop_Jos

Jos P.H. Benschop, 3rd Keynote

Jos P.H. Benschop / ASML, Veldhoven, The Netherlands,

Senior Vice President Technology

“EUV Lithography; past, present and future”

Benschop_Jos

Jos P.H. Benschop / ASML, Veldhoven, The Netherlands,

Senior Vice President Technology

“EUV Lithography; past, present and future”

Invited Speakers in sequence of the EMLC2020 Program

Bachar_Lena

Lena Bachar, Invited Speaker

Lena Bachar / Carl Zeiss SMS, Bar Lev Industrial Park, Misgav, Israel,

Application Projects Manager

“New registration calibration strategies for MBMW tools by PROVE measurements”

Bachar_Lena

Lena Bachar / Carl Zeiss SMS, Bar Lev Industrial Park, Misgav, Israel,

Application Projects Manager

“New registration calibration strategies for MBMW tools by PROVE measurements”

BUCK_Peter_INVITED

Peter Buck, Potential Invited Speaker (not yet confirmed)

Peter Buck / Mentor, a Siemens business, Wilsonville, OR, USA;

Director of Product Marketing, MPC & Fab Solutions; “Title to be defined"

BUCK_Peter_INVITED

Peter Buck / Mentor, a Siemens business, Wilsonville, OR, USA;

Director of Product Marketing, MPC & Fab Solutions; “Title to be defined"

ENOMOTO_Satoshi_INVITED

Satoshi Enomoto, Invited Speaker

Winner Best Poster - SPIE Photomask & EUV Lithography 2019; Satoshi Enomoto / Toyo Gosei, Chiba, Japan; Chief Chemist / Photosensitive Materials Research Center; “Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning”

ENOMOTO_Satoshi_INVITED

Winner Best Poster - SPIE Photomask & EUV Lithography 2019; Satoshi Enomoto / Toyo Gosei, Chiba, Japan; Chief Chemist / Photosensitive Materials Research Center; “Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning”

Jo-Finders

Jo Finders, Invited Speaker

Jo Finders / ASML, Veldhoven, The Netherlands

ASML Fellow and Group Leader Systems Engineering

“Imaging in EUV lithography: current status, high NA and future Resolution Enhancement”

Jo-Finders

Jo Finders / ASML, Veldhoven, The Netherlands

ASML Fellow and Group Leader Systems Engineering

“Imaging in EUV lithography: current status, high NA and future Resolution Enhancement”

GALLAGHER_Emily_INVITED

Emily Gallagher, Potential Invited Speaker (not yet confirmed)

Emily Gallagher / IMEC, Leuven, Belgium,

Principal member of technical staff; “Title to be defined"

GALLAGHER_Emily_INVITED

Emily Gallagher / IMEC, Leuven, Belgium,

Principal member of technical staff; “Title to be defined"

Dirk Hellweg

Dirk Hellweg, Invited Speaker

Dirk Hellweg / Carl Zeiss SMT, Oberkochen, Germany

Lead Systems Engineer; "EUV Lithography Optics: Current Status and Future Developments"

Dirk Hellweg

Dirk Hellweg / Carl Zeiss SMT, Oberkochen, Germany

Lead Systems Engineer; "EUV Lithography Optics: Current Status and Future Developments"

Riel_Heike

Heike Riel, Invited Speaker

Heike Riel / IBM Research, Rüschlikon, Switzerland;

IBM Fellow, Department Head Science & Technology; “Title t.b.d.”

Riel_Heike

Heike Riel / IBM Research, Rüschlikon, Switzerland;

IBM Fellow, Department Head Science & Technology; “Title t.b.d.”

Bild Thomas Schmidt

Thomas Schmidt, Invited Speaker

Thomas Schmidt / AMCT, Dresden, Germany,

General Manager; “Mask making 4.0“

Bild Thomas Schmidt

Thomas Schmidt / AMCT, Dresden, Germany,

General Manager; “Mask making 4.0“

SUNDERMANN_Frank_INVITED

Frank Sundermann, Invited Speaker

Frank Sundermann / ST Microelectronics, Crolles, France,

Mask Technology Principal Engineer; “A Storytelling of Mask Management in an advanced wafer fab”

SUNDERMANN_Frank_INVITED

Frank Sundermann / ST Microelectronics, Crolles, France,

Mask Technology Principal Engineer; “A Storytelling of Mask Management in an advanced wafer fab”

Tchikoulaeva_Anna

Anna Tchikoulaeva, Invited Speaker

Anna Tchikoulaeva / Lasertec U.S.A., Inc. Niederlassung Deutschland, Dresden;

Director of Strategic Marketing; "Title t.b.d." (topic: APMI – Actinic Patterned EUV Mask Inspection)

Tchikoulaeva_Anna

Anna Tchikoulaeva / Lasertec U.S.A., Inc. Niederlassung Deutschland, Dresden;

Director of Strategic Marketing; "Title t.b.d." (topic: APMI – Actinic Patterned EUV Mask Inspection)

TIRON_Raluca_INVITED

Raluca Tiron, Invited Speaker

Raluca Tiron / CEA-LETI, Grenoble, France,

Head of Advanced Lithography Laboratory; “Advanced lithography: when top-down meets bottom-up”

TIRON_Raluca_INVITED

Raluca Tiron / CEA-LETI, Grenoble, France,

Head of Advanced Lithography Laboratory; “Advanced lithography: when top-down meets bottom-up”

Takao Utsumi, Invited Speaker

Takao Utsumi / NanoLith LLC, Tokyo, Japan President

“New Nano Resolution and High Speed E-beam Lithography”

Takao Utsumi / NanoLith LLC, Tokyo, Japan President

“New Nano Resolution and High Speed E-beam Lithography”

Cooperating Partners