The focus of this 2½ day conference is state-of-the-art of mask technology and lithography, such as mask manufacturing, mask business, lithography and mask applications, emerging mask & lithography technologies, and mask & lithography equipment.
The new Conference Program will be available end of April 2020.
Peter De Bisschop, 1st Tutorial
Peter De Bisschop / IMEC, Leuven, Belgium Researcher Lithography
“Stochastic effects in lithography: the ultimate resolution limit?"
Rogier Verberk, 2nd Tutorial
Rogier Verberk / TNO, Delft, The Netherlands Director Semiconductor Equipment
"Synergy between Quantum Computing and Semiconductor Technology"
Takeo Watanabe, 3rd Tutorial
Takeo Watanabe / University of Hyogo, Hyogo, Japan Director of the Center for EUVL, Professor & Dean at the Univ. of Hyogo
“Current status and prospect for EUV lithography”
Luc Van Den Hove, 1st Keynote
Luc Van Den Hove / IMEC, Leuven, Belgium President & CEO imec “Title t.b.d.”
Frank E. Abboud, 2nd Keynote
Frank E. Abboud / Intel Corporation, Santa Clara, CA, USA
Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation
“Photomask Challenges for Upcoming Technology Nodes”
Jos P.H. Benschop, 3rd Keynote
Jos P.H. Benschop / ASML, Veldhoven, The Netherlands Senior Vice President Technology
“EUV Lithography; past, present and future”
Invited Speakers in sequence of the EMLC2020 Program
Lena Bachar, Invited Speaker
Lena Bachar / Carl Zeiss SMS, Bar Lev Industrial Park, Misgav, Israel Application Projects Manager
“New registration calibration strategies for MBMW tools by PROVE measurements”
Dirk Hellweg, Invited Speaker
Dirk Hellweg / Carl Zeiss SMT, Oberkochen, Germany
"EUV Lithography Optics: Current Status and Future Developments"
Heike Riel, Invited Speaker
Heike Riel / IBM Research, Rüschlikon, Switzerland IBM Fellow, Department Head Science & Technology
Thomas Schmidt, Invited Speaker
Thomas Schmidt / AMCT, Dresden, Germany
“Mask making 4.0“
Anna Tchikoulaeva, Invited Speaker
Anna Tchikoulaeva / Lasertec U.S.A., Inc. Zweigniederlassung Deutschland, Dresden Director of Strategic Marketing
“Title t.b.d. (topic: APMI – Actinic Patterned EUV Mask Inspection)”