EMLC

www.emlc-conference.com

| Photo provided by Toppan Photomasks
2023-04-24 event information

Program

Welcome to the EMLC 2023 in Dresden

The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. It provides an overview of the current state of mask and lithography technologies and future strategy. Mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.

Sessions on Monday, June 19th, 2023

Session 1: Tutorial on EUV Lithography

1st Tutorial
Technology of EUV Lithography Optics
Bernhard Kneer / Carl Zeiss SMT, Oberkochen (Germany)

2nd Tutorial
The Dawn of EUV Lithography Technology, and its Current Status and Future Prospect
Takeo Watanabe / University of Hyogo (Japan)    

 Session 2: Student Presentations

Sessions on Tuesday, June 20th, 2023

Session 3: 1st Plenary

Keynote
Neuromorphic Intelligence: mixed-signal spiking neural networks for on-line sensory processing at the edge
Giacomo Indiveri / Univ Zurich and ETH Zurich (Switzerland)

Keynote
Photomask technology as a key enabler of EUV in high volume manufacturing
Joe English / INTEL, Leixlip (Ireland)

Session 4: DUV and EUV Lithography

Keynote
Taking lithography to the max
Jo Finders / ASML, Veldhoven (The Netherlands)

Session 5: Mask Patterning and Processing

Session 6: Mask and Resist Optimization

Session 7: Poster Session

The first day ends with a Poster Session followed by the Conference Dinner Banquet at the “Pulverturm” in Dresden.

Sessions on Wednesday, June 20th, 2023

Session 8: 2nd PLENARY

KEYNOTE
Bosch Dresden – from Greenfield to High Yield
Christian Koitzsch / BOSCH, Dresden (Germany)

KEYNOTE
Infineon Dresden’s growth to a European Manufacturing and Development Hub
Dominik Thron / INFINEON, Dresden (Germany)

Session 9: Maskless Lithography and Metrology

Session 10: Mask Metrology, Tuning and Inspection and SC Sustainability

Session 11: Nano-Imprint Lithography (NIL)

Session 12: Data Analytics

At the end of the coneference the ZEISS Award for Talents in Photomask Industry for the Best Student Presentation will be presented.

Uwe Behringer, Conference Chair

EMLC 2023 Chair

Uwe Behringer

Uwe Behringer

Uwe Behringer, UBC Microelectronics, Germany

EMLC 2023 Conference Chair

Uwe Behringer

Uwe Behringer, UBC Microelectronics, Germany

EMLC 2023 Conference Chair

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