Program
Welcome to the EMLC 2023 in Dresden
The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. It provides an overview of the current state of mask and lithography technologies and future strategy. Mask manufacturers and users have the opportunity to familiarize themselves with the latest developments and results.
Sessions on Monday, June 19th, 2023
Session 1: Tutorial on EUV Lithography
1st Tutorial
Technology of EUV Lithography Optics
Bernhard Kneer / Carl Zeiss SMT, Oberkochen (Germany)
2nd Tutorial
The Dawn of EUV Lithography Technology, and its Current Status and Future Prospect
Takeo Watanabe / University of Hyogo (Japan)
Session 2: Student Presentations
Sessions on Tuesday, June 20th, 2023
Session 3: 1st Plenary
Keynote
Neuromorphic Intelligence: mixed-signal spiking neural networks for on-line sensory processing at the edge
Giacomo Indiveri / Univ Zurich and ETH Zurich (Switzerland)
Keynote
Photomask technology as a key enabler of EUV in high volume manufacturing
Joe English / INTEL, Leixlip (Ireland)
Session 4: DUV and EUV Lithography
Keynote
Taking lithography to the max
Jo Finders / ASML, Veldhoven (The Netherlands)
Session 5: Mask Patterning and Processing
Session 6: Mask and Resist Optimization
Session 7: Poster Session
The first day ends with a Poster Session followed by the Conference Dinner Banquet at the “Pulverturm” in Dresden.
Sessions on Wednesday, June 20th, 2023
Session 8: 2nd PLENARY
KEYNOTE
Bosch Dresden – from Greenfield to High Yield
Christian Koitzsch / BOSCH, Dresden (Germany)
KEYNOTE
Infineon Dresden’s growth to a European Manufacturing and Development Hub
Dominik Thron / INFINEON, Dresden (Germany)
Session 9: Maskless Lithography and Metrology
Session 10: Mask Metrology, Tuning and Inspection and SC Sustainability
Session 11: Nano-Imprint Lithography (NIL)
Session 12: Data Analytics
At the end of the coneference the ZEISS Award for Talents in Photomask Industry for the Best Student Presentation will be presented.
Uwe Behringer, Conference Chair
- Program EMLC 2023 PDF 405 KB
- Tutorial-Keynote-Invited Presenters EMLC 2023 PDF 816 KB
EMLC 2023 Chair
Uwe Behringer
Uwe Behringer, UBC Microelectronics, Germany
EMLC 2023 Conference Chair
Uwe Behringer, UBC Microelectronics, Germany
EMLC 2023 Conference Chair