EMLC

www.emlc-conference.com

| Photo provided by Toppan Photomasks
2018-08-06 event information 389 0

Program

The focus of this 2½ day conference is state-of-the-art of mask technology and lithography, such as mask manufacturing, mask business, lithography and mask applications, emerging mask & lithography technologies, and mask & lithography equipment.

The new Conference Program will be available end of April 2020.

Tutorial Speakers

De-Bisschop_Peter

Peter De Bisschop, 1st Tutorial

Peter De Bisschop / IMEC, Leuven, Belgium Researcher Lithography

“Stochastic effects in lithography: the ultimate resolution limit?"

De-Bisschop_Peter

Peter De Bisschop / IMEC, Leuven, Belgium Researcher Lithography

“Stochastic effects in lithography: the ultimate resolution limit?"

VERBERK_Rogier_2nd-TUTORIAL

Rogier Verberk, 2nd Tutorial

Rogier Verberk / TNO, Delft, The Netherlands Director Semiconductor Equipment

"Synergy between Quantum Computing and Semiconductor Technology"

VERBERK_Rogier_2nd-TUTORIAL

Rogier Verberk / TNO, Delft, The Netherlands Director Semiconductor Equipment

"Synergy between Quantum Computing and Semiconductor Technology"

Watanabe_Takeo

Takeo Watanabe, 3rd Tutorial

Takeo Watanabe / University of Hyogo, Hyogo, Japan Director of the Center for EUVL, Professor & Dean at the Univ. of Hyogo

“Current status and prospect for EUV lithography”

Watanabe_Takeo

Takeo Watanabe / University of Hyogo, Hyogo, Japan Director of the Center for EUVL, Professor & Dean at the Univ. of Hyogo

“Current status and prospect for EUV lithography”

Keynote Speakers

VAN-DEN-HOVE_Luc_1st-KEYNOTE

Luc Van Den Hove, 1st Keynote

Luc Van Den Hove / IMEC, Leuven, Belgium President & CEO imec “Title t.b.d.”

VAN-DEN-HOVE_Luc_1st-KEYNOTE

Luc Van Den Hove / IMEC, Leuven, Belgium President & CEO imec “Title t.b.d.”

Abboud_Frank

Frank E. Abboud, 2nd Keynote

Frank E. Abboud / Intel Corporation, Santa Clara, CA, USA

Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation

“Photomask Challenges for Upcoming Technology Nodes”

Abboud_Frank

Frank E. Abboud / Intel Corporation, Santa Clara, CA, USA

Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation

“Photomask Challenges for Upcoming Technology Nodes”

Benschop_Jos

Jos P.H. Benschop, 3rd Keynote

Jos P.H. Benschop / ASML, Veldhoven, The Netherlands Senior Vice President Technology

“EUV Lithography; past, present and future”

Benschop_Jos

Jos P.H. Benschop / ASML, Veldhoven, The Netherlands Senior Vice President Technology

“EUV Lithography; past, present and future”

Invited Speakers in sequence of the EMLC2020 Program

Bachar_Lena

Lena Bachar, Invited Speaker

Lena Bachar / Carl Zeiss SMS, Bar Lev Industrial Park, Misgav, Israel Application Projects Manager

“New registration calibration strategies for MBMW tools by PROVE measurements”

Bachar_Lena

Lena Bachar / Carl Zeiss SMS, Bar Lev Industrial Park, Misgav, Israel Application Projects Manager

“New registration calibration strategies for MBMW tools by PROVE measurements”

Dirk Hellweg

Dirk Hellweg, Invited Speaker

Dirk Hellweg / Carl Zeiss SMT, Oberkochen, Germany

"EUV Lithography Optics: Current Status and Future Developments"

Dirk Hellweg

Dirk Hellweg / Carl Zeiss SMT, Oberkochen, Germany

"EUV Lithography Optics: Current Status and Future Developments"

Riel_Heike

Heike Riel, Invited Speaker

Heike Riel / IBM Research, Rüschlikon, Switzerland IBM Fellow, Department Head Science & Technology

“Title t.b.d.”

Riel_Heike

Heike Riel / IBM Research, Rüschlikon, Switzerland IBM Fellow, Department Head Science & Technology

“Title t.b.d.”

Bild Thomas Schmidt

Thomas Schmidt, Invited Speaker

Thomas Schmidt / AMCT, Dresden, Germany

“Mask making 4.0“

Bild Thomas Schmidt

Thomas Schmidt / AMCT, Dresden, Germany

“Mask making 4.0“

Tchikoulaeva_Anna

Anna Tchikoulaeva, Invited Speaker

Anna Tchikoulaeva / Lasertec U.S.A., Inc. Zweigniederlassung Deutschland, Dresden Director of Strategic Marketing

“Title t.b.d. (topic: APMI – Actinic Patterned EUV Mask Inspection)”

Tchikoulaeva_Anna

Anna Tchikoulaeva / Lasertec U.S.A., Inc. Zweigniederlassung Deutschland, Dresden Director of Strategic Marketing

“Title t.b.d. (topic: APMI – Actinic Patterned EUV Mask Inspection)”

Cooperating Partners