EMLC
42nd Mask and Lithography Conference EMLC 2027 | Dresden, Germany | June 15-17, 2027
Flashback: EMLC Conference 2026 in Jena
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The EMLC Conference
annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Within this platform, researchers and users have the opportunity to both familiarize themselves with the latest developments and results as well as to enter into fruitful discussion with colleagues from different companies and research institutions.

May we invite you to the EMLC Conference 2027 in Dresden?

Dresden, the capital city of the Free State of Saxony, is one of Germany’s most compelling and sophisticated destinations for conferences, conventions, and corporate events, where grand baroque architecture meets a vibrant modern art scene along the Elbe River. Globally renowned as "Florence on the Elbe," the city offers an enchanting mix of old-world grandeur and modern creativity that you cannot find anywhere else in Germany.

Your EMLC 2026 Conference Chairs

Jo Finders and Ines Stolberg

target audience

Target Audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

target audience

The EMLC Conference annually brings together scientists, researchers, engineers and developers from around the world to present innovations at the forefront of research, manufacturing and application.

It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

Committee

Committee Members

Committee

The EMLC 2027 International Program Committee

Honorary President
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany

Conference Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Tekscend Photomask, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Loeschner, Hans, IMS Nanofabrication, Brunn am Gebirge & Vienna, Austria
Bottiglieri, Gerardo, ASML, The Netherlands
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Peters, Jan Hendrik, BMBG Consult, Radebeul, Germany


Other Program Committee Members
Abboud, Frank, Intel Corporation, Santa Clara, CA, USA
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Fay, Aurelien, CEA-Leti, Grenoble, France
Galler, Reinhard, EQUIcon, Dresden, Germany
Hai, Xueying, Mycronic AB, Täby, Sweden
Jefferies, James, HOYA Europe, London, UK
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Maas, Raymond, ASML, Veldhoven, The Netherlands
Maly, Enrico, Photronics MZD GmbH, Dresden, Germany
Matsumoto, Hiroshi, NuFlareTechnology, Yokohama, Japan
Muehlberger, Michael, Profactor, Steyr-Gleink, Austria
Noack, Nico, AMTC Dresden, Germany
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Scheruebl, Thomas, Carl Zeiss SMT, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Offenbach am Main, Germany
Schneider, Jens, Infineon Technologies, Dresden, Germany
Schuch, Nivea, Applied Materials, Grenoble, France
Sundermann, Frank, STMicroelectronics, Crolles, France
Tchikoulaeva, Anna, Lasertec, Dresden, Germany
Tschinkl, Martin, Tekscend Photomask, Dresden, Germany
Varga, Ksenija, EV Group, St. Florian am Inn, Austria
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Zeggaoui, Nassima, Siemens Industry Software Inc., Meylan, France
Zurbrick, Larry, Keysight, Santa Rosa, CA, USA

ZEISS Award for Talents in Photomask Industry - Submit your paper!

Turn your research into recognition and submit your paper in the field of lithography and photomasks now and win participation in the ZEISS European Summer School along with a 2,500 EUR prize.

Take this opportunity to showcase your ideas and research, receive valuable feedback und connect with experts. The award will be presented at the European Mask and Lithography Conference 2026. The abstract submission deadline is January 27, 2026.

Turn your research into recognition and submit your paper in the field of lithography and photomasks now and win participation in the ZEISS European Summer School along with a 2,500 EUR prize.

Take this opportunity to showcase your ideas and research, receive valuable feedback und connect with experts. The award will be presented at the European Mask and Lithography Conference 2026. The abstract submission deadline is January 27, 2026.

ZEISS endows the "ZEISS Award for Talents in Photomask Industry" 

The award was established in 2016 to support students working in the fields of photomasks.

To be considered,

  • The student must present a poster or presentation at European Mask and Lithography Conference
  • The students must identify themselves as a student during abstract submission
  • The student must be the lead manuscript author
  • The student must attend the conference and present it during the session or be present during the poster session


Assessment - Award Committee

The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.


The Award - Invitation to ZEISS European Summer School

Winners will be awarded a ZEISS certificate and a trophy. He or she will be invited to the ZEISS European Summer School in Oberkochen, Germany, where students get deep insights into ZEISS’ semiconductor optics manufacturing and related aspects of semiconductor technology. The event is triggered by the Important Project of Common European Interest (IPCEI) to support research, innovation and the first industrial deployment of microelectronics and communication technologies across the value chain. 
The winner will have the opportunity to present his/ her paper in this unique environment. Travel costs for the ZEISS European Summer school will be covered.  

Donation

In addition, a donation to the amount of 2,500 EUR will be granted.

call for papers

Call for Papers

Venue/ Travel Info/ Hotel booking

Hilton Dresden
An der Frauenkirche 5, 01067 Dresden, 
Germany
phone: +49 (0)351 8642-0
E-Mail: info@hiltondresden.com


Hilton Hotel Dresden - on the doorstep of Dresden's Old Town - Your Event Location

The Hilton Hotel is located at the heart of Dresden's Old Town, one block from the River Elbe and overlooking Dresden's Frauenkirche, the Church of Our Lady. Hilton is within a kilometer of local dining and historic sites, such as the Zwinger building and its surrounding gardens. Enjoy access to the health club, featuring a fitness center, indoor pool with sauna, outdoor whirlpool - and, above all: Enjoy the EMLC Conference 2027 in Dresden!

The room rate is € 152 per night including breakfast.

Reservations can be canceled free of charge up to 7 days before arrival. For cancellations made after this date, 90% of the room rate will be charged as a cancellation fee. A credit card guarantee is required to book a room. 

The room rates quoted include a generous breakfast buffet, service charges, and use of the LivingWell Health Club (fitness center). A fee of €3.00 per person per day is charged for use of the swimming pool, whirlpool, and saunas. The lodging tax applicable in Dresden is not included in the room rate.

Rooms are available from 3:00 p.m. on the day of arrival and may be used until 12:00 p.m. on the day of departure.

Please use the underlined link for your bookings!

Contact ak

Contact

Contact ak

Please contact GMM-Office for questions concerning the conference.

You would like to be informed about the next steps concerning this conference? So please register as prospective customer.

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previous events

Previous Events

Important Dates

Dates in 2026

new date: February 18, 2026 

Submission of abstracts

April 14, 2026

Notification of acceptance for authors

June 22-24, 2026

EMLC Conference 2026 in Jena, Germany

Extended to August 31, 2026  

Submission of manuscripts to SPIE




Cooperating Partners