Presentation of ZEISS Award for Talents in Photomask Industry
Thomas Scheruebl, Carls Zeiss SMT, Jena, Germany; Nicolas Triomphe, Centre de Biologie Structurale, INSERM, CNRS, Université de Montpellier, France; Uwe Behringer, EMLC 2024 Conference Chair

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Flashback: EMLC 2024


MINATEC Conference Center

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Top-class EMLC Conference 2024 in Grenoble, France

For the third time, the EMLC (European Mask and Lithography Conference) took place in France at the MINTAC Center Grenoble. This follows the pattern that the conference is held every two years in a country other than Germany, in one of Europe's semiconductor centers. With 180 participants and 10 exhibitors, the conference was very well received. For some years now, the conference has also been inviting students to a “one day taster”, which was also gladly accepted in Grenoble. The conference was chaired by Dr. Uwe Behringer.

The day-to-day significance of the topic was reflected not only in an extensive conference program with 4 keynotes, 44 lectures and 14 posters, but also in the top-class keynotes by the CEO of CEA Leiti, Sébastien Dauvé, and Serge Nicoleau, Group Vice President Technology, STMicroelectronics.

A highlight of the conference was the presentation of the ZEISS Award for Young Scientists by Thomas Scheruebl. The prize was awarded to Mr. Nicolas Triomphe, Centre de Biologie Structurale, INSERM, CNRS, Université de Montpellier.

EMLC Conference 2024 - Impressions


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