It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

The EMLC 2025 International Program Committee

Honorary President
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany

Conference Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Tekscend Photomask, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Loeschner, Hans, IMS Nanofabrication, Brunn am Gebirge & Vienna, Austria
Bottiglieri, Gerardo, ASML, The Netherlands
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Peters, Jan Hendrik, BMBG Consult, Radebeul, Germany

Other Program Committee Members
Abboud, Frank, Intel Corporation, Santa Clara, CA, USA
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Fay, Aurelien, CEA-Leti, Grenoble, France
Galler, Reinhard, EQUIcon, Dresden, Germany
Hai, Xueying, Mycronic AB, Täby, Sweden
Jefferies, James, HOYA Europe, London, UK
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Maas, Raymond, ASML, Veldhoven, The Netherlands
Maly, Enrico, Photronics MZD GmbH, Dresden, Germany
Matsumoto, Hiroshi, NuFlareTechnology, Yokohama, Japan
Muehlberger, Michael, Profactor, Steyr-Gleink, Austria
Noack, Nico, AMTC Dresden, Germany
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Scheruebl, Thomas, Carl Zeiss SMT, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Offenbach am Main, Germany
Schneider, Jens, Infineon Technologies, Dresden, Germany
Schuch, Nivea, Applied Materials, Grenoble, France
Sundermann, Frank, STMicroelectronics, Crolles, France
Tchikoulaeva, Anna, Lasertec, Dresden, Germany
Tschinkl, Martin, Tekscend Photomask, Dresden, Germany
Varga, Ksenija, EV Group, St. Florian am Inn, Austria
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shusuke, Carl Zeiss Co., Ltd., Tokyo, Japan
Zeggaoui, Nassima, Siemens Industry Software Inc., Meylan, France
Zurbrick, Larry, Keysight Technologies, Santa Clara, USA

ZEISS endows the "ZEISS Award for Talents in Photomask Industry" 

The award was established in 2016 to support students working in the fields of photomasks.

To be considered,

• The student must present a poster or presentation at European Mask and Lithography Conference
• The students must identify themselves as a student during abstract submission
• The student must be the lead manuscript author
• The student must attend the conference and present it during the session or be present during the poster session

Assessment - Award Committee

The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.

The Award - Invitation to ZEISS European Summer School

Winners will be awarded a ZEISS certificate and a trophy. He or she will be invited to the ZEISS European Summer School in Oberkochen, Germany, where students get deep insights into ZEISS’ semiconductor optics manufacturing and related aspects of semiconductor technology. The event is triggered by the Important Project of Common European Interest (IPCEI) to support research, innovation and the first industrial deployment of microelectronics and communication technologies across the value chain. 
The winner will have the opportunity to present his/ her paper in this unique environment. Travel costs for the ZEISS European Summer school will be covered.  

Donation

In addition, a donation to the amount of 2,500 EUR will be granted.

Please contact GMM-Office for questions concerning the conference.

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