The Award for Talents in the Photomask Industry was established in 2016 to support students working in the fields of photomasks.
To be considered,
- The student must present a poster or presentation at European Mask and Lithography Conference
- The students must identify themselves as a student during abstract submission
- The student must be the lead manuscript author
- The student must attend the conference and present it during the session or be present during the poster session
The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.
Winners will be awarded a ZEISS certificate and a trophy. In addition, the winner will be invited to present his work at SPIE Photomask Technology Conference in Monterey / CA. He receives a donation of 2500 EUR to cover the travel expenses.