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copyright: VDE e.V.
2021-04-16

Chairs and Panelists

EMLC 2021 Chair

Uwe Behringer

Uwe Behringer

Uwe Behringer, UBC Microelectronics, Germany

EMLC 2021 Conference Chair

Uwe Behringer

Uwe Behringer, UBC Microelectronics, Germany

EMLC 2021 Conference Chair

Panel Chairs and Panelists Panel 1 - 08:15 - 09:30

Jo-Finders

Jo Finders

Jo Finders, ASML, The Netherlands

Panel Chair - Panel 1 on EUV Lithography

Jo-Finders

Jo Finders, ASML, The Netherlands

Panel Chair - Panel 1 on EUV Lithography

Albrecht Ehrmann

Albrecht Ehrmann, Carl Zeiss SMT, Germany

Panel Co-Chair - Panel 1 on EUV Lithography

Albrecht Ehrmann, Carl Zeiss SMT, Germany

Panel Co-Chair - Panel 1 on EUV Lithography

Gijsbert Rispens

Gijsbert Rispens, ASML, The Netherlands

EUV system engineering imaging and resist

Panelist - Panel 1 on EUV Lithography

Gijsbert Rispens, ASML, The Netherlands

EUV system engineering imaging and resist

Panelist - Panel 1 on EUV Lithography

Ardavan Niroomand

Ardavan Niroomand, IMEC, Belgium

Program director for ASML/IMEC Advanced Patterning Center

Panelist - Panel 1 on EUV Lithography

Ardavan Niroomand, IMEC, Belgium

Program director for ASML/IMEC Advanced Patterning Center

Panelist - Panel 1 on EUV Lithography

Heiko Feldmann

Heiko Feldmann, Carl Zeiss SMT, Germany

Head of Roadmap, initiating technology and product developments for semiconductor manufacturing equipment

Panelist - Panel 1 on EUV Lithography

Heiko Feldmann, Carl Zeiss SMT, Germany

Head of Roadmap, initiating technology and product developments for semiconductor manufacturing equipment

Panelist - Panel 1 on EUV Lithography

Hazem Mesilhy

Hazem Mesilhy, Fraunhofer IISB, Germany

PhD researcher, computational litho, High-NA EUV, mask 3D, optical simulations, multi-objective optimization

Panelist - Panel 1 on EUV Lithography

Hazem Mesilhy, Fraunhofer IISB, Germany

PhD researcher, computational litho, High-NA EUV, mask 3D, optical simulations, multi-objective optimization

Panelist - Panel 1 on EUV Lithography

Renzo Capelli

Renzo Capelli, Carl Zeiss SMT, Germany

System Engineering Semiconductor Mask Solutions AIMS EUV

Panelist - Panel 1 on EUV Lithography

Renzo Capelli, Carl Zeiss SMT, Germany

System Engineering Semiconductor Mask Solutions AIMS EUV

Panelist - Panel 1 on EUV Lithography

Jan van Schoot

Jan van Schoot, ASML, The Netherlands

Director EUV System Engineering

Panelist - Panel 1 on EUV Lithography

Jan van Schoot, ASML, The Netherlands

Director EUV System Engineering

Panelist - Panel 1 on EUV Lithography

Panel Chairs and Panelists Panel 2 - 09:30 - 11:00

Jan-Hendrik Peters

Jan-Hendrik Peters, BMBG Consult, Germany

Panel Chair - Panel 2 on EUV Mask Topics

Jan-Hendrik Peters, BMBG Consult, Germany

Panel Chair - Panel 2 on EUV Mask Topics

Martin Tschinkl

Martin Tschinkl, Toppan Europe

Panel Co-Chair - Panel 2 on EUV Mask Topics

Martin Tschinkl, Toppan Europe

Panel Co-Chair - Panel 2 on EUV Mask Topics

Tilmann Heil

Tilmann Heil, Carl Zeiss SMS, Germany

Mask Repair; Mask Qualification; EUV: scaling for advanced nodes, High NA, phase shifting masks

Panelist - Panel 2 on EUV Mask Topics

Tilmann Heil, Carl Zeiss SMS, Germany

Mask Repair; Mask Qualification; EUV: scaling for advanced nodes, High NA, phase shifting masks

Panelist - Panel 2 on EUV Mask Topics

Eelco van Setten

Eelco van Setten, ASML, The Netherlands

EUV Imaging - specifically High-NA, mask contribution to imaging or EPE

Panelist - Panel 2 on EUV Mask Topics

Eelco van Setten, ASML, The Netherlands

EUV Imaging - specifically High-NA, mask contribution to imaging or EPE

Panelist - Panel 2 on EUV Mask Topics

Takahiro Onoue

Takahiro Onoue, HOYA, Japan

EUV materials, especially PSM, transparent backside

Panelist - Panel 2 on EUV Mask Topics

Takahiro Onoue, HOYA, Japan

EUV materials, especially PSM, transparent backside

Panelist - Panel 2 on EUV Mask Topics

Kei Hattori

Kei Hattori, SHIBAURA, Japan

EUV clean and etch, material properties, layout requirements

Panelist - Panel 2 on EUV Mask Topics

Kei Hattori, SHIBAURA, Japan

EUV clean and etch, material properties, layout requirements

Panelist - Panel 2 on EUV Mask Topics

Joost Bekaert

Joost Bekaert, IMEC, Belgium

Stitching and black borders, CNT pellicle, contour metrology, OPC

Panelist - Panel 2 on EUV Mask Topics

Joost Bekaert, IMEC, Belgium

Stitching and black borders, CNT pellicle, contour metrology, OPC

Panelist - Panel 2 on EUV Mask Topics

Don Gun Lee

Don Gun Lee, ESOL, South Korea

EUV phase shift measurements, microscope, pellicle transmission

Panelist - Panel 2 on EUV Mask Topics

Don Gun Lee, ESOL, South Korea

EUV phase shift measurements, microscope, pellicle transmission

Panelist - Panel 2 on EUV Mask Topics

Panel Chairs and Panelists Panel 3 - 14:45 - 16:00

LE-GRATIET_Bertrand_Photo

Bertrand Le-Gratiet

Bertrand Le-Gratiet, STMicroelectronics, Crolles, France

Fellow Lithography/ Metrology

Panel Chair - Panel 3 on Manufacturing Data Analytics

LE-GRATIET_Bertrand_Photo

Bertrand Le-Gratiet, STMicroelectronics, Crolles, France

Fellow Lithography/ Metrology

Panel Chair - Panel 3 on Manufacturing Data Analytics

Serap Savari

Serap Savari, Texas A&M University, USA

Panel Co-Chair - Panel 3 on Manufacturing Data Analytics

Serap Savari, Texas A&M University, USA

Panel Co-Chair - Panel 3 on Manufacturing Data Analytics

Philippe Leduc

Philippe Leduc, ST Microelectronics, Singapore

Principal Engineer Applied Mathematics & Scientific Computing, Technical advisor Manufacturing Data Analytics

Panelist Panel 3 on Manufacturing Data Analytics

Philippe Leduc, ST Microelectronics, Singapore

Principal Engineer Applied Mathematics & Scientific Computing, Technical advisor Manufacturing Data Analytics

Panelist Panel 3 on Manufacturing Data Analytics

Benjamin Lenz

Benjamin Lenz, Infineon, Germany

Infineon Technologies AG Head of Operations AI and Analytics

Panelist - Panel 3 on Manufacturing Data Analytics

Benjamin Lenz, Infineon, Germany

Infineon Technologies AG Head of Operations AI and Analytics

Panelist - Panel 3 on Manufacturing Data Analytics

Harry J. Levinson

Harry J. Levinson, HJL Lithography, USA

HJL Lithography, LLC provides consulting and training services in lithography and lithography process control

Panelist - Panel 3 on Manufacturing Data Analytics

Harry J. Levinson, HJL Lithography, USA

HJL Lithography, LLC provides consulting and training services in lithography and lithography process control

Panelist - Panel 3 on Manufacturing Data Analytics

Jelle Nije

Jelle Nije, ASML, The Netherlands

Senior product manager, Advanced Analytics portfolio enabling fast time to insight and optimize decision making

Panelist Panel 3 on Manufacturing Data Analytics

Jelle Nije, ASML, The Netherlands

Senior product manager, Advanced Analytics portfolio enabling fast time to insight and optimize decision making

Panelist Panel 3 on Manufacturing Data Analytics

Clemens Utzny

Clemens Utzny, KLA-QONIAC, Germany

Qoniac provides revolutionary lithography & patterning optimization for the semiconductor industry

Panelist - Panel 3 on Manufacturing Data Analytics

Clemens Utzny, KLA-QONIAC, Germany

Qoniac provides revolutionary lithography & patterning optimization for the semiconductor industry

Panelist - Panel 3 on Manufacturing Data Analytics

Panel Chairs and Panelists Panel 4 - 16:00 - 17:15

Andreas Erdmann

Andreas Erdmann

Andreas Erdmann, Fraunhofer IISB, Erlangen, Germany

Head of the Fraunhofer IISB lithography and optics group

Panel Chair - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Andreas Erdmann

Andreas Erdmann, Fraunhofer IISB, Erlangen, Germany

Head of the Fraunhofer IISB lithography and optics group

Panel Chair - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Ines Stolberg

Ines Stolberg, Vistec Electron Beam, Germany

Manager Sales & Marketing

Panel Co-Chair - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Ines Stolberg, Vistec Electron Beam, Germany

Manager Sales & Marketing

Panel Co-Chair - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

René Carpaij

René Carpaij, ASML, The Netherlands

Group Leader - EUV Imaging

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

René Carpaij, ASML, The Netherlands

Group Leader - EUV Imaging

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Jan Hoentschel

Jan Hoentschel, Globalfoundries, Germany

Director Integration & Technology

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Jan Hoentschel, Globalfoundries, Germany

Director Integration & Technology

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

LE-GRATIET_Bertrand_Photo

Bertrand Le-Gratiet

Bertrand Le-Gratiet, STMicroelectronics, Crolles, France

Fellow Lithography/ Metrology; Panel Chair - Panel 3 on Manufacturing Data Analytics and

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

LE-GRATIET_Bertrand_Photo

Bertrand Le-Gratiet, STMicroelectronics, Crolles, France

Fellow Lithography/ Metrology; Panel Chair - Panel 3 on Manufacturing Data Analytics and

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Hans-Jürgen Stock

Hans-Jürgen Stock, Synopsys Munich, Germany

Manager Research and Prototyping

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Hans-Jürgen Stock, Synopsys Munich, Germany

Manager Research and Prototyping

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Michael Woittennek

Michael Woittennek, X-Fab, Germany

Manager Process Engineering

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Michael Woittennek, X-Fab, Germany

Manager Process Engineering

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Holger Jennewein

Holger Jennewein, Carl Zeiss SMT, Germany

Director Optics Metrology

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Holger Jennewein, Carl Zeiss SMT, Germany

Director Optics Metrology

Panelist - Panel 4 on Career opportunities for young scientists and engineers in semiconductor lithography and mask industry

Sponsors

Cooperating Partners